APPLICATIONS

Sisom has grown more than 50 different material films in single wafers, using LPSPEED, VPSPEED, and
GPSPEED, as shown in this table:

Cu Cd(1-x)ZnxS AlxGaySz(PO4)
Sn InSnO LiSiO
ZnO (undoped and doped with Al, Ga, or In) CdSnO LiPO
ZnS ZrB2 LiAlTiPO
SnO RuO LiAlPO
In2O3 Mn2O3 LiAlGaSPO
Al2O3 LiCoO2 LiBPO
CuS LiMn2O4 LiAlSrSiO
SnS LiNiO LiZrNbO
In2S3 LiMnNiCoAlO TiO
CdS (undoped and doped with Al, or B) LiNiCoAlO  LiSnO
Cdx-yAlyS LiFePO  LiSnSiO
ZnxMgyCdzS LiFeMnO
CuInS2 LiMnAlO
Cu2SnS3 LiCoAlO
Cu2ZnSn(S,Se)4 LiVO

SPEED is applicable to

  • Deposition of metal
  • Deposition of glass
  • Deposition of metal oxide
  • Deposition of sulfide
  • Deposition of other complex solid-state materials
  • Deposition of composite materials
  • Binary through hexanery compositions
  • Water based solvents

Solid state materials and devices that are well suited for SISOM’s process, include:

  • Photovoltaics
  • LCD flex displays
  • LEDs
  • Lens coatings
  • Electrolyte films