APPLICATIONS
Sisom has grown more than 50 different material films in single wafers, using LPSPEED, VPSPEED, and
GPSPEED, as shown in this table:
Cu | Cd(1-x)ZnxS | AlxGaySz(PO4) |
Sn | InSnO | LiSiO |
ZnO (undoped and doped with Al, Ga, or In) | CdSnO | LiPO |
ZnS | ZrB2 | LiAlTiPO |
SnO | RuO | LiAlPO |
In2O3 | Mn2O3 | LiAlGaSPO |
Al2O3 | LiCoO2 | LiBPO |
CuS | LiMn2O4 | LiAlSrSiO |
SnS | LiNiO | LiZrNbO |
In2S3 | LiMnNiCoAlO | TiO |
CdS (undoped and doped with Al, or B) | LiNiCoAlO | LiSnO |
Cdx-yAlyS | LiFePO | LiSnSiO |
ZnxMgyCdzS | LiFeMnO | |
CuInS2 | LiMnAlO | |
Cu2SnS3 | LiCoAlO | |
Cu2ZnSn(S,Se)4 | LiVO |
SPEED is applicable to
- Deposition of metal
- Deposition of glass
- Deposition of metal oxide
- Deposition of sulfide
- Deposition of other complex solid-state materials
- Deposition of composite materials
- Binary through hexanery compositions
- Water based solvents
Solid state materials and devices that are well suited for SISOM’s process, include:
- Photovoltaics
- LCD flex displays
- LEDs
- Lens coatings
- Electrolyte films